Harvard's Center for Nanoscale Systems (CNS) has recently ordered a second Elionix EBL system. With a guaranteed linewidth of 5nm and superior large field writing uniformity, the Elionix ELS-F125 goes well beyond today's 100kV EBL tools. For more information, see the press release on the Harvard CNS Electron Beam Lithography order.
In the April 2011 edition of R&D Magazine, SVTA is featured in the cover story, The Transformation of Deposition. To read this article in its entirety, click here.
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