Harvard's CNS Orders 2nd Elionix EBL System

Harvard's Center for Nanoscale Systems (CNS) has recently ordered a second Elionix EBL system. With a guaranteed linewidth of 5nm and superior large field writing uniformity, the Elionix ELS-F125 goes well beyond today's 100kV EBL tools. For more information, see the press release on the Harvard CNS Electron Beam Lithography order.