Elionix

The Elionix ELS-F125 is the only Electron Beam Lithography system in the world to guarantee fabrication of 5 nanometer linewidths. In addition to being the only system to offer an accelerating voltage of 125 kV, the ELS-F125 has dramatically increased throughtput, reduced distortion in large write fields, and reduced footprint from previous generation models.

The Elionix ELS-7000 is capable of generating patterns with a line width of less than 8 nm. The highly precise laser interferometer stage that the ELS-7000 employs is based on 30 years of expertise with lithography systems.

The Elionix ELS-7800 Electron Beam Lithography (EBL) system is capable of writing an 8 nm line with an acceleration voltage of 80 kV. The ELS-7800 comes standard with the Elionix developed CAD system that accepts conventional CAD formats.